- Václav Holý: Pulsed-laser deposition growth of LuFeO3 – in-situ x-ray scattering and growth models
- 24. 11. 2021, 14:10
- online (zoom)
- more information
Abstract:
Epitaxial layers of hexagonal LuFeO3 were deposited by oxygen-assisted pulsed laser deposition on various substrates (Al2O3, yttria-stabilized zirconia, platinum). The growth chamber was attached to a high-resolution synchrotron beamline at KARA storage ring at KIT, Karlsruhe, which made it possible to study growth kinetics in-situ during deposition. For the investigation of growth kinetics, we measured in-situ grazing-incidence x-ray scattering and wide-angle x-ray diffraction in quasi-forbidden 0003 diffraction maximum. From the data we determined various stages of growth (lateral growth of islands, island percolation and growth of continuous layers) and the time development of surface morphology. The in-situ measurements were combined by post-growth x-ray diffraction reciprocal-space mapping, AFM and high-resolution TEM. The measured data have been compared with simulations, carried out by kinetic Monte-Carlo method and by solution of phenomenological rate equations.