Typical applications
Diffractometer dedicated to the x-ray diffraction measurements of polycrystalline thin films and epitaxial layers. High resolution x-ray diffraction, reciprocal space mapping, reflectivity measurements, single crystal measurements. Non-ambient x-ray diffraction of thin films and epitaxial layers using the DHS 1100 high temperature dome, up to 1100°C. Residual stress and texture measurements.
Available methods
- diffraction studies of polycrystalline thin films and epitaxial layers
- high resolution x-ray diffraction
- reflectivity measurements
- reciprocal space mapping
- in-situ high temperature x-ray diffraction studies
Technical specification
- Θ-2Θ horizontal goniometer
- sealed x-ray tube source, Cu radiation
- parallel beam mirror
- high resolution setup
- hybrid monochromator (mirror+Ge220)
- (Ge 220 double bounce monochromator, 3 bounce Ge 220 analyzer)
- 0D, 1D, 2D detector PIXcel3D (hybrid pixel, single photon counting technology)
- Eulerian cradle
- polycapillary x-ray optics (stress and texture measurements)
- parallel plate collimator
- high temperature chamber DHS 1100 dome (Anton Paar), working in vacuum or in Ar or N atmosphere
